Dielectric etching equipment is used extensively for etching dielectric material during the manufacturing process of a semiconductor. The dielectric etching process is an anisotropic process that removes various dielectric substances such as silicon nitride, silicon oxide and different overlying photoresist mask. In many cases, carbon monoxide is used in various dielectric etching process owing to its higher profile control and higher selectivity over oxygen-based or fluorocarbon etch processes. The market growth of semiconductor dielectric etching equipment market is highly dependent on the growth of the overall semiconductor market globally.
Some of the leading players operating in the semiconductor dielectric etching equipment market includes Applied Materials (U.S), AMEC (China), Lam Research (U.S), SPTS Technologies (U.K) and Oxford Instruments (U.K) among others.
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